Information for "350 nm process"
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Display title | 350 nm process |
Default sort key | 350 Nanometer |
Page length (in bytes) | 2,597 |
Namespace ID | 0 |
Page ID | 9769974 |
Page content language | en - English |
Page content model | wikitext |
Indexing by robots | Allowed |
Number of page watchers | Fewer than 30 watchers |
Number of redirects to this page | 4 |
Counted as a content page | Yes |
Wikidata item ID | Q1050761 |
Local description | Semiconductor manufacturing processes with a 350 nm MOSFET technology node |
Central description | semiconductor manufacturing processes with a 350 nm MOSFET technology node |
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Edit history
Page creator | Darin-0 (talk | contribs) |
Date of page creation | 12:19, 28 February 2007 |
Latest editor | Paper Luigi (talk | contribs) |
Date of latest edit | 05:23, 7 February 2024 |
Total number of edits | 71 |
Recent number of edits (within past 30 days) | 0 |
Recent number of distinct authors | 0 |